Wedge thin films in the nano- or micrometer ranges may be of the outmost importance for metrology applications and the fabrication of different kinds of optical devices at the microscale. In the present work we present a new procedure for the plasma deposition of wedge thin films where the length of the wedge region and the slope of the film surface with respect of the substrate can be controlled by adjusting the deposition conditions. The developed method consists of a plasma enhanced chemical vapor deposition (PECVD) process where the precursor is supplied in a parallel direction towards the surface facing a shadow obstacle that alters the density distribution and flow lines of the precursor flux. This methodology has been applied for the deposition of ZnO proving that both the slope and the size of the wedge zone can be controlled by adjusting the deposition geometry. The optical properties of these wedge films has been determined with nanometric resolution with a recently developed optical ellipsometric tool. Moreover, to unravel the key features of the deposition procedure and understand the factors controlling the development of these wedge films a simulation analysis has been carried out that has properly reproduced the PECVD process conditions and the evolution of their nanostructure of the film along the wedge region.
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