Uranium oxides or uranium doped metal oxides are promising materials as catalysts for visible light driven photo-oxidation of water. Suitable precursors for the material synthesis of these compounds were scarce limiting the use of gas phase or liquid phase material processing from metal organic molecular compounds. The current work describes the synthesis of new volatile uranium and uranyl complexes suitable for gas phase deposition of the respective oxides as pure material or as dopant into different oxide matrices. These complexes show significantly enhanced properties in terms of volatility and stability, which improves significantly their application in CVD processes. The complexes have been used as single source precursors for the chemical vapour phase deposition of uranium oxide thin films using a low pressure, cold wall MOCVD and plasma-enhanced CVD. The resulting nanostructured films are tested as electrode materials in photoelectrochemical cells.